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COMPARISON OF THE Ti/n-GaAs SCHOTTKY CONTACTS PARAMETERS FABRICATED USING DC MAGNETRON SPUTTERING AND THERMAL EVAPORATION     
Yazarlar
Osman Kahveci
Doç. Dr. Abdullah AKKAYA Doç. Dr. Abdullah AKKAYA
Kırşehir Ahi Evran Üniversitesi
Enise Ayyildiz
Abdulmecit Turut
Özet
We have fabricated the Ti/n-type GaAs Schottky diodes (SDs) by the DC magnetron deposition and thermal evaporation, cut from the same GaAs substrates, and we have made a comparative study of the current-voltage (I-V) measurements of both SDs in the measurement temperature range of 160-300K with steps of 10 K. The barrier height (BH) values of about 0.82 and 0.76 eV at 300K have been obtained for the sputtered and evaporated SDs, respectively. It has been seen that the apparent BH value for the diodes has decreased with decreasing temperature obeying the single-Gaussian distribution (GD) for the evaporated diode and the double-GD for the sputtered diode over the whole measurement temperature range. The increment in BH and observed discrepancies in the sputtered diode have been attributed to the reduction in the native oxide layer present on the substrate surface by the high energy of the sputtered atoms and to sputtering-induced defects present in the near-surface region. We conclude that the thermal evaporation technique yields better quality Schottky contacts for use in electronic devices compared to the DC magnetron deposition technique.
Anahtar Kelimeler
Schottky diode | barrier inhomogeneity | GaAs | current-voltage characteristics | Gaussian distribution
Makale Türü Özgün Makale
Makale Alt Türü SSCI, AHCI, SCI, SCI-Exp dergilerinde yayımlanan tam makale
Dergi Adı SURFACE REVIEW AND LETTERS
Dergi ISSN 0218-625X
Dergi Tarandığı Indeksler SCI
Makale Dili İngilizce
Basım Tarihi 06-2017
Cilt No 24
Sayı 4
Sayfalar 1750047 /
Doi Numarası 10.1142/S0218625X17500470
Makale Linki http://dx.doi.org/10.1142/s0218625x17500470